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Proceedings Paper

Repairing 45 nm node defects through nano-machining
Author(s): Roy White; Andrew Dinsdale; Tod Robinson; David Brinkley; Jeffrey Csuy; David Lee
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Paper Abstract

Recently questions have been raised about whether high aspect ratio (HAR) NanoBitsTM can be effectively utilized to repair extension defects in 45 nm node and beyond. The primary concern has been how the effect of NanoBitTM deflection impacts edge placement, sidewall angle and z-depth control repeatability. Higher aspect ratio bits are required for defects that arise as mask feature sizes become smaller. As the aspect ratio of the NanoBitTM continues to increase to meet these demands, the cross sectional area of the bit used for nanomachining becomes thinner and more susceptible to bending under the forces applied during the nanomachining process. This is especially true when deeper features that require HAR NanoBitsTM are being repaired. To overcome this trend RAVE LLC has developed a new repair process that utilizes the strength of the bit shape. Repair of 45 nm node defects that require HAR NanoBitsTM will be demonstrated using a new repair process and cantilever design.

Paper Details

Date Published: 30 October 2007
PDF: 11 pages
Proc. SPIE 6730, Photomask Technology 2007, 673021 (30 October 2007); doi: 10.1117/12.748668
Show Author Affiliations
Roy White, RAVE LLC (United States)
Andrew Dinsdale, RAVE LLC (United States)
Tod Robinson, RAVE LLC (United States)
David Brinkley, RAVE LLC (United States)
Jeffrey Csuy, RAVE LLC (United States)
David Lee, RAVE LLC (United States)

Published in SPIE Proceedings Vol. 6730:
Photomask Technology 2007
Robert J. Naber; Hiroichi Kawahira, Editor(s)

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