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Proceedings Paper

Growth of laser damage in fused silica: diameter to depth ratio
Author(s): Mary A. Norton; John J. Adams; C. Wren Carr; Eugene E. Donohue; Michael D. Feit; Richard P. Hackel; William G. Hollingsworth; Jeffrey A. Jarboe; Manyalibo J. Matthews; Alexander M. Rubenchik; Mary L. Spaeth
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Paper Abstract

Growth of laser initiated damage plays a major role in determining optics lifetime in high power laser systems. Previous measurements have established that the lateral diameter grows exponentially. Knowledge of the growth of the site in the propagation direction is also important, especially so when considering techniques designed to mitigate damage growth, where it is required to reach all the subsurface damage. In this work, we present data on both the diameter and the depth of a growing exit surface damage sites in fused silica. Measured growth rates with both 351 nm illumination and with combined 351 nm and 1054 nm illumination are discussed.

Paper Details

Date Published: 18 December 2007
PDF: 10 pages
Proc. SPIE 6720, Laser-Induced Damage in Optical Materials: 2007, 67200H (18 December 2007); doi: 10.1117/12.748441
Show Author Affiliations
Mary A. Norton, Lawrence Livermore National Lab. (United States)
John J. Adams, Lawrence Livermore National Lab. (United States)
C. Wren Carr, Lawrence Livermore National Lab. (United States)
Eugene E. Donohue, Lawrence Livermore National Lab. (United States)
Michael D. Feit, Lawrence Livermore National Lab. (United States)
Richard P. Hackel, Lawrence Livermore National Lab. (United States)
William G. Hollingsworth, Lawrence Livermore National Lab. (United States)
Jeffrey A. Jarboe, Lawrence Livermore National Lab. (United States)
Manyalibo J. Matthews, Lawrence Livermore National Lab. (United States)
Alexander M. Rubenchik, Lawrence Livermore National Lab. (United States)
Mary L. Spaeth, Lawrence Livermore National Lab. (United States)


Published in SPIE Proceedings Vol. 6720:
Laser-Induced Damage in Optical Materials: 2007
Gregory J. Exarhos; Arthur H. Guenther; Keith L. Lewis; Detlev Ristau; M. J. Soileau; Christopher J. Stolz, Editor(s)

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