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Proceedings Paper

Simultaneous model-based main feature and SRAF optimization for 2D SRAF implementation to 32 nm critical layers
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Paper Abstract

Sub-resolution Assist Feature (SRAF) insertion is one of the most important Resolution Enhancement Techniques (RET) for the 65 nm, 45 nm nodes and beyond. In this paper, we are proposing a novel approach for the optimum placement of 2D SRAF structures using state of the art Calibre RET flow. In this approach, the optimal SRAF shapes are achieved simultaneously during the OPC step. The SRAF and main features are optimized to account for their edge placement and process window metrics (aerial image slope/contrast, out of focus/dose EPE, etc...). The resulting mask shapes deliver some of the properties that can be obtained using the Inverse Lithography Techniques (ILT), such as excellent Process Window Performance, while there is almost no impact on the runtime. The implemented model-based optimization flow remains compatible with the current OPC production flows.

Paper Details

Date Published: 30 October 2007
PDF: 10 pages
Proc. SPIE 6730, Photomask Technology 2007, 67302K (30 October 2007); doi: 10.1117/12.747448
Show Author Affiliations
Ayman Yehia, Mentor Graphics Corp. (Egypt)
Alexander Tritchkov, Mentor Graphics Corp. (United States)


Published in SPIE Proceedings Vol. 6730:
Photomask Technology 2007
Robert J. Naber; Hiroichi Kawahira, Editor(s)

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