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Proceedings Paper

Automating defect disposition in fabs and maskshops
Author(s): Peter Fiekowsky; S. Narukawa; T. Kawashima
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Paper Abstract

ADAS (Automated Defect Analysis Software) is the first product to fully automate mask defect analysis for mask shops and fabs. ADAS classifies and dispositions photomask defects quickly and accurately. Disposition is based on defect size and printability measurements from simulation. Full analysis of inspection reports with 100 defects requires 2 seconds. Printability measurements match AIMS within 6 percent at 3 sigma on 45 nm test masks. Repeatability is 5 percent at 3 sigma over multiple inspections. ADAS can reduce the need for production AIMS measurements by 90% and eliminate operator review errors and the repelliclizations they cause. ADAS increases overall inspection efficiency for mask shop first-inspection and final inspection. It can automate fab requalification inspections and eliminate the need for incoming inspection.

Paper Details

Date Published: 1 November 2007
PDF: 8 pages
Proc. SPIE 6730, Photomask Technology 2007, 67303R (1 November 2007); doi: 10.1117/12.747268
Show Author Affiliations
Peter Fiekowsky, Automated Visual Inspection (United States)
S. Narukawa, Dai Nippon Printing Co., Ltd. (Japan)
T. Kawashima, Dai Nippon Printing Co., Ltd. (Japan)


Published in SPIE Proceedings Vol. 6730:
Photomask Technology 2007
Robert J. Naber; Hiroichi Kawahira, Editor(s)

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