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Proceedings Paper

Implementation of an efficient defect classification method in photomask mass production
Author(s): Cathy Liu; Crystal Wang; Skin Zhang; Eric Guo; Steven Liu; Eric Haodong Lu; Dongsheng Fan; Den Wang; Weiming Ma
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Paper Abstract

In photomask production environments, increasing productivity of defect inspection and improving fidelity of defect classification are important for mask makers to improve capacity of defect inspection tools and to enhance quality of production. In particular, defect classification time corresponds directly to the cost and the cycle time of mask manufacturing and new product development. KLA-Tencor has introduced an automatic defect grouping tool "ReviewSmart" which automatically bins defects with high fidelity. ReviewSmart has been reported in engineering R&D and evaluation. In this paper, we focus on implementation of ReviewSmart in photomask production. 592 plates were processed during the evaluation period. Those plates are for products of logic, memory and flash. Technology nodes are from 65nm to 180nm. With optimized production setting, the automatic defect grouping tool - ReviewSmart improves productivity of defect inspection by 7% with 100% fidelity. In addition to improve productivity, ReviewSmart is helpful to classify aggressive OPC caused nuisance, troubleshoot process issues and expedite product development and improve usable inspection sensitivity as well.

Paper Details

Date Published: 1 November 2007
PDF: 8 pages
Proc. SPIE 6730, Photomask Technology 2007, 67303P (1 November 2007); doi: 10.1117/12.747189
Show Author Affiliations
Cathy Liu, Semiconductor Manufacturing International Corp. (China)
Crystal Wang, Semiconductor Manufacturing International Corp. (China)
Skin Zhang, Semiconductor Manufacturing International Corp. (China)
Eric Guo, Semiconductor Manufacturing International Corp. (China)
Steven Liu, KLA-Tencor Corp. (United States)
Eric Haodong Lu, KLA-Tencor Corp. (United States)
Dongsheng Fan, KLA-Tencor Corp. (United States)
Den Wang, KLA-Tencor Corp. (United States)
Weiming Ma, KLA-Tencor Corp. (United States)

Published in SPIE Proceedings Vol. 6730:
Photomask Technology 2007
Robert J. Naber; Hiroichi Kawahira, Editor(s)

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