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Proceedings Paper

Contrast properties of spatial light modulators for microlithography
Author(s): J. Heber; D. Kunze; P. Dürr; D. Rudloff; M. Wagner; P. Björnängen; J. Luberek; U. Berzinsh; T. Sandström; T. Karlin
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Paper Abstract

The present article discusses steps for the realistic description of optical properties of micro-mirror arrays (MMA), which are utilized as programmable masks for microlithography. The article focuses on global contrast as an elementary example for the understanding of MMA's diffractive operation principle. Central point will be a discussion of those MEMS properties that influence the global MMA contrast, and how to introduce them into simulation. Surface corrugations of single mirrors and slit properties will be taken into account. Comparison is made with experimental contrast data to validate the theoretical assumptions.

Paper Details

Date Published: 30 October 2007
PDF: 10 pages
Proc. SPIE 6730, Photomask Technology 2007, 673035 (30 October 2007); doi: 10.1117/12.747015
Show Author Affiliations
J. Heber, Fraunhofer Institut für Photonische Mikrosysteme (Germany)
D. Kunze, Fraunhofer Institut für Photonische Mikrosysteme (Germany)
P. Dürr, Fraunhofer Institut für Photonische Mikrosysteme (Germany)
D. Rudloff, Fraunhofer Institut für Photonische Mikrosysteme (Germany)
M. Wagner, Fraunhofer Institut für Photonische Mikrosysteme (Germany)
P. Björnängen, Micronic Laser Systems AB (Sweden)
J. Luberek, Micronic Laser Systems AB (Sweden)
U. Berzinsh, Micronic Laser Systems AB (Sweden)
T. Sandström, Micronic Laser Systems AB (Sweden)
T. Karlin, Micronic Laser Systems AB (Sweden)


Published in SPIE Proceedings Vol. 6730:
Photomask Technology 2007
Robert J. Naber; Hiroichi Kawahira, Editor(s)

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