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Proceedings Paper

Metrology for templates of UV nano imprint lithography
Author(s): Kouji Yoshida; Kouichirou Kojima; Makoto Abe; Shiho Sasaki; Masaaki Kurihara; Hiroshi Mohri; Naoya Hayashi
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Paper Abstract

Templates for UV-Nano-imprint lithography (NIL) have developed aggressively. Feature sizes of the templates have come to less than 30 nm. Therefore metrology is also one of challenging items to fabricate templates for UV-NIL. However, there are many issues in metrology for the templates, for instance, necessity of the further resolution for measurement tools, charging issues without conductive layers for a SEM. In this paper, we will focus on metrology of the templates for UV-NIL. And also some measurement techniques are described about detail results using scanning probe microscope, CD-SEM, scattermetry and so on.

Paper Details

Date Published: 30 October 2007
PDF: 8 pages
Proc. SPIE 6730, Photomask Technology 2007, 67305O (30 October 2007); doi: 10.1117/12.746802
Show Author Affiliations
Kouji Yoshida, Dai Nippon Printing Co., Ltd. (Japan)
Kouichirou Kojima, Dai Nippon Printing Co., Ltd. (Japan)
Makoto Abe, Dai Nippon Printing Co., Ltd. (Japan)
Shiho Sasaki, Dai Nippon Printing Co., Ltd. (Japan)
Masaaki Kurihara, Dai Nippon Printing Co., Ltd. (Japan)
Hiroshi Mohri, Dai Nippon Printing Co., Ltd. (Japan)
Naoya Hayashi, Dai Nippon Printing Co., Ltd. (Japan)

Published in SPIE Proceedings Vol. 6730:
Photomask Technology 2007
Robert J. Naber; Hiroichi Kawahira, Editor(s)

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