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Proceedings Paper

Accurate lithography analysis for yield prediction
Author(s): Greg Yeric; Babak Hatamian; Rahul Kapoor
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Paper Abstract

New DFM tools appearing on the market hold a promise of assessing parametric and functional yield loss due to lithography effects. The accuracy of underlying models can limit the veracity of such assessment. For example, many lithography steps used in the fab are extremely nonlinear and might exhibit significant differences from models used by the DFM tools. Furthermore, inputs used in calibrating a model can limit its accuracy, and most organizations are challenged to characterize the exact needs of a lithography model at a statistically relevant sampling size. After discussing potential sources of inaccuracy in modeling, the paper will describe a methodology for modeling and yield prediction based on such accurate modeling.

Paper Details

Date Published: 30 October 2007
PDF: 11 pages
Proc. SPIE 6730, Photomask Technology 2007, 67300S (30 October 2007); doi: 10.1117/12.746797
Show Author Affiliations
Greg Yeric, Synopsys, Inc. (United States)
Babak Hatamian, Synopsys, Inc. (United States)
Rahul Kapoor, Synopsys, Inc. (United States)

Published in SPIE Proceedings Vol. 6730:
Photomask Technology 2007
Robert J. Naber; Hiroichi Kawahira, Editor(s)

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