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Proceedings Paper

A generic technique for reducing OPC iteration: fast forward OPC
Author(s): Le Hong; John Sturtevant
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Paper Abstract

The drive toward advanced technology nodes has drastically increased the computational complexity of optical proximity correction (OPC). Applying full-chip OPC to all critical layers has become the most computational demanding step in the tape-out process. Tuning for fast and accurate OPC recipes is a critical step in the development of a total manufacturing solution. OPC is by design an iterative cycle, where one iteration is a single simulation and polygon fragmentation shift sequence. Typically an accurate OPC recipe requires eight or more iterations to converge to a final best solution. The number of iterations in a recipe directly impacts the full-chip OPC runtime. Engineers often find themselves spending hours tuning an OPC recipe to reduce just one iteration. This paper presents a generic technique called Fast Forward OPC (FFOPC). FFOPC will help to reduce any golden OPC recipe that meets certain requirements to a fixed 4 iterations with minimum accuracy lost. Most importantly this technique can be easily implemented as a plugin with any existing OPC tools.

Paper Details

Date Published: 30 October 2007
PDF: 10 pages
Proc. SPIE 6730, Photomask Technology 2007, 67302M (30 October 2007); doi: 10.1117/12.746757
Show Author Affiliations
Le Hong, Mentor Graphics Corp. (United States)
John Sturtevant, Mentor Graphics Corp. (United States)


Published in SPIE Proceedings Vol. 6730:
Photomask Technology 2007
Robert J. Naber; Hiroichi Kawahira, Editor(s)

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