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Proceedings Paper

Modeling polarized illumination for OPC/RET
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Paper Abstract

Recent research has shown that properly polarized light source enhances image contrast in photolithography for manufacturing integrated circuit (IC) devices, thus improves the effectiveness of optical proximity correction (OPC) and other resolution enhancement techniques (RET). However, current OPC/RET modeling software can only model the light source polarization of simple types, such as TE, TM, X, Y, or sector polarization with relatively simple configuration. Realistic polarized light used in scanners is more complex than the aforementioned simple ones. As a result, simulation accuracy and quality of the OPC result will be compromised by the simplification of the light source polarization modeling in the traditional approach. With ever shrinking CD error budget in the manufacturing of IC's at advanced technology nodes, more accurate and comprehensive light source modeling for lithography simulations and OPC/RET is needed. In this paper, we present a modeling framework that takes arbitrarily polarized light source. Based on polarization state vector descriptions of the light source, it unifies optical simulations of unpolarized, partially polarized, and completely polarized illuminations. We built this framework into Synopsys' OPC modeling tool ProGen. Combined with ProGen's existing capability to handle vectorial aberration by the projection lens, large angle effects due to high NA, and thin film effects, this framework represents a general vectorial model for optical imaging with the state-of-the-art scanners. Numerical experiments were performed to study CD impact of various illumination polarization modeling schemes in the context of OPC/RET.

Paper Details

Date Published: 1 November 2007
PDF: 10 pages
Proc. SPIE 6730, Photomask Technology 2007, 673057 (1 November 2007); doi: 10.1117/12.746742
Show Author Affiliations
Hua Song, Synopsys, Inc. (United States)
Qiaolin Zhang, Synopsys, Inc. (United States)
James Shiely, Synopsys, Inc. (United States)

Published in SPIE Proceedings Vol. 6730:
Photomask Technology 2007
Robert J. Naber; Hiroichi Kawahira, Editor(s)

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