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Proceedings Paper

Using the AIMS 45-193i for hyper-NA imaging applications
Author(s): Peter De Bisschop; Vicky Philipsen; Robert Birkner; Ute Buttgereit; Rigo Richter; Thomas Scherübl
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Paper Abstract

We have tested the validity of the so-called 'vector-effect emulation mode' of the newest member of the AIMSTM family, the AIMSTM45-193i, that was recently developed for Hyper-NA applications. This vector-effect emulation mode (also called 'scanner mode') converts the measured signals into a prediction of what the image-in-resist of a Hyper-NA scanner would be (so including vector- and polarization effects). We've done a number of experiments that directly test the validity of this vector-effect emulation, by comparing them to rigorous lithographic simulations and to CD-measurements from printed NA=1.20 scanner wafers, and found that the AIMSTM 45-193i results are in fact quite accurate. Afterwards we looked at a number of potential Hyper-NA imaging applications for the AIMSTM 45-193i, again comparing it to rigorous simulations and wafer CD-measurements. These results indicate that, next to its traditional use as reticle-inspection tool, the AIMSTM 45-193i has potential use also in the wafer fab as an 'imaging-inspection' or 'OPC-defect inspection' tool, especially when applied to 2D patterns.

Paper Details

Date Published: 30 October 2007
PDF: 12 pages
Proc. SPIE 6730, Photomask Technology 2007, 67301G (30 October 2007); doi: 10.1117/12.746688
Show Author Affiliations
Peter De Bisschop, IMEC (Belgium)
Vicky Philipsen, IMEC (Belgium)
Robert Birkner, Carl Zeiss SMS GmbH (Germany)
Ute Buttgereit, Carl Zeiss SMS GmbH (Germany)
Rigo Richter, Carl Zeiss SMS GmbH (Germany)
Thomas Scherübl, Carl Zeiss SMS GmbH (Germany)

Published in SPIE Proceedings Vol. 6730:
Photomask Technology 2007
Robert J. Naber; Hiroichi Kawahira, Editor(s)

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