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Proceedings Paper

New method of identification of false or nuisance defects using defect imaging system DIS-05
Author(s): Hao Zhang; Katsuyuki Takahashi; Hideaki Bando; Yasunobu Kitayama; Akio Sugano; Kenichi Kobayashi
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Paper Abstract

This article presents novel defect review tool developed from CD-SEM, and its application for identification, classification and judgment of false or nuisance defects. Mask inspection tool is indispensable for mask production. Since conventional inspection tools use the optical source, some of the defects are difficult to be identified and classified in the proper manner because the tool resolution is not sufficient. We have developed the Defect Imaging System (DIS-05) based on CD-SEM which uses secondary electron and backscattered electron images. These SEM images are used for reviewing the defects detected in advance by optical inspection tools. This system also includes Die-to-Die, Die-to-Database and "any shaped pattern area measurement" of Holon original development.

Paper Details

Date Published: 16 November 2007
PDF: 10 pages
Proc. SPIE 6730, Photomask Technology 2007, 67303M (16 November 2007); doi: 10.1117/12.746667
Show Author Affiliations
Hao Zhang, Holon Co., Ltd. (Japan)
Katsuyuki Takahashi, Holon Co., Ltd. (Japan)
Hideaki Bando, Holon Co., Ltd. (Japan)
Yasunobu Kitayama, Holon Co., Ltd. (Japan)
Akio Sugano, Holon Co., Ltd. (Japan)
Kenichi Kobayashi, Holon Co., Ltd. (Japan)

Published in SPIE Proceedings Vol. 6730:
Photomask Technology 2007
Robert J. Naber; Hiroichi Kawahira, Editor(s)

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