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Proceedings Paper

The behavior of substrate dependency as surface treatment in the positive chemically amplified resist
Author(s): Sin-Ju Yang; Han-Sun Cha; Ju-Hyun Kang; Chul-Kyu Yang; Jin-Ho Ahn; Kee-Soo Nam
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Paper Abstract

Positive chemically amplified resist (CAR) is widely used because of its benefit to high resolution in the semiconductor industry. Recent numerous studies have reported that resist pattern error such as resist scum and adhesion fail at the interface between substrate and positive CAR is caused by substrate dependency. Hence resist pattern error must be minimized. In this study we have observed the phenomena at the positive CAR coated mask blanks. And then we applied various surface treatments to the Cr film to minimize resist pattern error. Firstly, resist pattern error was occurred by the substrate dependency in the positive CAR coated mask blanks. We have investigated the root causes of this pattern error, we found that nitrogen radical and OH radical in the Cr film could combine with proton in the positive CAR easily. So various surface treatments were applied to minimize detrimental effects of substrate dependency to the positive CAR. And the behavior of substrate dependency was observed by various analyses to verify the effect of surface treatment method. The results showed that substrate dependency could be controlled by surface treatment in the positive CAR coated mask blanks.

Paper Details

Date Published: 30 October 2007
PDF: 12 pages
Proc. SPIE 6730, Photomask Technology 2007, 67300J (30 October 2007); doi: 10.1117/12.746652
Show Author Affiliations
Sin-Ju Yang, S&S Tech Corp. (South Korea)
Han-Sun Cha, Hanyang Univ. (South Korea)
Ju-Hyun Kang, S&S Tech Corp. (South Korea)
Chul-Kyu Yang, S&S Tech Corp. (South Korea)
Jin-Ho Ahn, Hanyang Univ. (South Korea)
Kee-Soo Nam, S&S Tech Corp. (South Korea)

Published in SPIE Proceedings Vol. 6730:
Photomask Technology 2007
Robert J. Naber; Hiroichi Kawahira, Editor(s)

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