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Proceedings Paper

Simulation of larger mask areas using the waveguide method with fast decomposition technique
Author(s): Peter Evanschitzky; Feng Shao; Andreas Erdmann; David Reibold
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Paper Abstract

A new and optimized waveguide based electromagnetic field solver with decomposition technique for rigorous optical and extreme ultraviolet (EUV) mask near field simulations is presented. The model allows to perform full three dimensional (full 3D) simulations as well as three dimensional simulations based on a decomposition technique (Q3D, "Q" means "quasi"). After a short introduction of the waveguide method the decomposition technique is presented. Subsequently the capabilities of the new electromagnetic field solver are demonstrated exemplarily based on state-of-the-art optical and EUV systems. The simulation of larger mask areas and the fast simulation of standard sized mask areas is shown. A comparison between the full 3D and the Q3D approach demonstrates the field of application of the decomposition technique.

Paper Details

Date Published: 30 October 2007
PDF: 9 pages
Proc. SPIE 6730, Photomask Technology 2007, 67301P (30 October 2007); doi: 10.1117/12.746631
Show Author Affiliations
Peter Evanschitzky, Fraunhofer Institute of Integrated Systems and Device Technology (Germany)
Feng Shao, Fraunhofer Institute of Integrated Systems and Device Technology (Germany)
Andreas Erdmann, Fraunhofer Institute of Integrated Systems and Device Technology (Germany)
David Reibold, Fraunhofer Institute of Integrated Systems and Device Technology (Germany)


Published in SPIE Proceedings Vol. 6730:
Photomask Technology 2007
Robert J. Naber; Hiroichi Kawahira, Editor(s)

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