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Proceedings Paper

A semi-automated AFM photomask repair process for manufacturing application using SPR6300
Author(s): Mario Dellagiovanna; Hidenori Yoshioka; Hiroyuki Miyashita; Shiaki Murai; Takuya Nakaue; Osamu Takaoka; Atsushi Uemoto; Syuichi Kikuchi; Ryoji Hagiwara; Stephane Benard
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Paper Abstract

For almost a decade Nanomachining application has been studied and developed to repair next generation of photomasks. This technique, based on Atomic Force Microscopy (AFM), applies a mechanical removing of the defects with almost negligible quartz-damage, high accuracy of the edge-placement and without spurious depositions (stain, implanted elements, etc.) that may affect the optical transmission. SII NanoTechnology Inc. (SIINT) is carrying out a joint-development project with DNP Photomask Europe S.p.A. (DPE) that has allowed the installation in DPE of the next generation state-of-the-art AFM based system SPR6300 to meet the repair specifications for the 65 nm Node. Drift phenomena of the AFM probe represent one of the major obstacles for whichever kind of nano-manipulation (imaging and material or pattern modification). AFM drift undermines the repeatability and accuracy performances of the process. The repair methodology, called NewDLock, implemented on SPR6300, is a semi-automated procedure by which the drift amount, regardless of its origin, is estimated in advance and compensated during the process. Now AFM Nanomachining approach is going to reveal properties of repeatability and user-friendly utilization that make it suitable for the production environment.

Paper Details

Date Published: 30 October 2007
PDF: 11 pages
Proc. SPIE 6730, Photomask Technology 2007, 673020 (30 October 2007); doi: 10.1117/12.746405
Show Author Affiliations
Mario Dellagiovanna, DNP Photomask Europe SpA (Italy)
Hidenori Yoshioka, DNP Photomask Europe SpA (Italy)
Hiroyuki Miyashita, DNP Photomask Europe SpA (Italy)
Shiaki Murai, Dai Nippon Printing Co., Ltd. (Japan)
Takuya Nakaue, SII NanoTechnology Inc. (Japan)
Osamu Takaoka, SII NanoTechnology Inc. (Japan)
Atsushi Uemoto, SII NanoTechnology Inc. (Japan)
Syuichi Kikuchi, SII NanoTechnology Inc. (Japan)
Ryoji Hagiwara, SII NanoTechnology Inc. (Japan)
Stephane Benard, Bs Technology eurl (France)

Published in SPIE Proceedings Vol. 6730:
Photomask Technology 2007
Robert J. Naber; Hiroichi Kawahira, Editor(s)

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