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Proceedings Paper

EMF simulations of isolated and periodic 3D photomask patterns
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Paper Abstract

We present rigorous 3D EMF simulations of isolated features on photomasks using a newly developed finite-element method. We report on the current status of the finite-element solver JCMsuite, incorporating higher-order edge elements, adaptive refinement methods, and fast solution algorithms. We demonstrate that rigorous and accurate results on light scattering off isolated features can be achived at relatively low computational cost, compared to the standard approach of simulations on large-pitch, periodic computational domains.

Paper Details

Date Published: 30 October 2007
PDF: 11 pages
Proc. SPIE 6730, Photomask Technology 2007, 67301W (30 October 2007); doi: 10.1117/12.746392
Show Author Affiliations
Sven Burger, Zuse Institute Berlin (Germany)
JCMwave GmbH (Germany)
Lin Zschiedrich, Zuse Institute Berlin (Germany)
JCMwave GmbH (Germany)
Frank Schmidt, Zuse Institute Berlin (Germany)
JCMwave GmbH (Germany)
Roderick Köhle, Qimonda AG (Germany)
Bernd Küchler, Qimonda Dresden GmbH & Co. OHG (Germany)
Christoph Nölscher, Qimonda Dresden GmbH & Co. OHG (Germany)


Published in SPIE Proceedings Vol. 6730:
Photomask Technology 2007
Robert J. Naber; Hiroichi Kawahira, Editor(s)

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