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Proceedings Paper

Projection maskless patterning (PMLP) for the fabrication of leading-edge complex masks and nano-imprint templates
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Paper Abstract

The reliable and cost-effective fabrication of 2D and 3D structured nano-surfaces is prerequisite for a number of industrial and emerging applications: (i) leading-edge complex masks, (ii) high precision nano-imprint templates, (iii) nano-functionalized surfaces and 3D structures for applications in nano-photonics, nano-magnetics, and nano-biotechnology. Projection Mask-Less Patterning (PMLP) is based on many hundred thousands of ion beams working in parallel. A PMLP proof-of-concept tool has been realized as part of the European project CHARPAN (Charged Particle Nanotech; www.charpan.com). The novel ion beam projection optics with 200x reduction shows 16nm half pitch resolution. First results with a programmable aperture plate system have been achieved demonstrating high accuracy and flexible pattern fabrication.

Paper Details

Date Published: 30 October 2007
PDF: 9 pages
Proc. SPIE 6730, Photomask Technology 2007, 673033 (30 October 2007); doi: 10.1117/12.746363
Show Author Affiliations
Elmar Platzgummer, IMS Nanofabrication AG (Austria)
Hans Loeschner, IMS Nanofabrication AG (Austria)
Gerhard Gross, IMS Nanofabrication AG (Austria)


Published in SPIE Proceedings Vol. 6730:
Photomask Technology 2007
Robert J. Naber; Hiroichi Kawahira, Editor(s)

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