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Proceedings Paper

Long-term critical dimension measurement performance for a new mask CD-SEM, S-9380M
Author(s): Zhigang Wang; Kock Khuen Seet; Ritsuo Fukaya; Yasuhiro Kadowaki; Noriaki Arai; Makoto Ezumi; Hidetoshi Satoh
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Paper Abstract

To realize good repeatability in CD measurements, many issues have to be addressed including system stability, sample charging and contamination, measurement conditions, and image processing. The S-9380M is a mask CD-SEM (Critical Dimension Scanning Electron Microscope) system developed for measurement and inspection of 45 nm node photomask. The S-9380M has several innovations like a newly designed optical system to minimize sample charge-up and drift effects, ultra-high resolution (3nm) imaging to enable measurements at high magnification, and an integrated ultra-violet (UV) unit for pre-treatment of the mask to rid the surface of organic contaminants. This paper presents measurements carried out using the S-9380M system, and showed that superior performance is achieved with short-term dynamic repeatability of 3σ less than 0.6 nm (for line patterns), and long-term dynamic repeatability of 3σ less than 1.0 nm without trend modification.

Paper Details

Date Published: 1 November 2007
PDF: 9 pages
Proc. SPIE 6730, Photomask Technology 2007, 67304T (1 November 2007); doi: 10.1117/12.746332
Show Author Affiliations
Zhigang Wang, Hitachi High-Technologies Corp. (Japan)
Kock Khuen Seet, Hitachi High-Technologies Corp. (Japan)
Ritsuo Fukaya, Hitachi High-Technologies Corp. (Japan)
Yasuhiro Kadowaki, Hitachi High-Technologies Corp. (Japan)
Noriaki Arai, Hitachi High-Technologies Corp. (Japan)
Makoto Ezumi, Hitachi High-Technologies Corp. (Japan)
Hidetoshi Satoh, Hitachi High-Technologies Corp. (Japan)

Published in SPIE Proceedings Vol. 6730:
Photomask Technology 2007
Robert J. Naber; Hiroichi Kawahira, Editor(s)

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