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Proceedings Paper

Large aperture low threshold current 980nm VCSELs fabricated with pulsed anodic oxidation
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Paper Abstract

Pulsed anodic oxidation technique, a new way of forming current blocking layers, was successfully used in ridge-waveguide QW laser fabrication. We apply this method in 980nm VCSELs fabrication to form a high-quality native oxide current blocking layer, which simplify the device process. A significant reduction of threshold current and a distinguished device performance are achieved. The 500μm-diameter device has a current threshold as low as 0.48W. The maximum CW operation output power at room temperature is 1.48W. The lateral divergence angle θparalleland vertical divergence angle θperpendicular are as low as 15.3° and 13.8° without side-lobes at a current of 6A.

Paper Details

Date Published: 12 December 2007
PDF: 9 pages
Proc. SPIE 6782, Optoelectronic Materials and Devices II, 678228 (12 December 2007); doi: 10.1117/12.742775
Show Author Affiliations
Jinjiang Cui, Changchun Institute of Optics, Fine Mechanics and Physics (China)
Graduate School of Chinese Academy of Sciences (China)
Yongqiang Ning, Changchun Institute of Optics, Fine Mechanics and Physics (China)
Te Li, Changchun Institute of Optics, Fine Mechanics and Physics (China)
Graduate School of Chinese Academy of Sciences (China)
Guangyu Liu, Changchun Institute of Optics, Fine Mechanics and Physics (China)
Graduate School of Chinese Academy of Sciences (China)
Yan Zhang, Changchun Institute of Optics, Fine Mechanics and Physics (China)
Graduate School of Chinese Academy of Sciences (China)
Biao Peng, Changchun Institute of Optics, Fine Mechanics and Physics (China)
Graduate School of Chinese Academy of Sciences (China)
Yanfang Sun, Changchun Institute of Optics, Fine Mechanics and Physics (China)
Graduate School of Chinese Academy of Sciences (China)
Lijun Wang, Changchun Institute of Optics, Fine Mechanics and Physics (China)


Published in SPIE Proceedings Vol. 6782:
Optoelectronic Materials and Devices II
Yoshiaki Nakano, Editor(s)

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