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Proceedings Paper

Electron-beam processing effect on photoemitting-structures parameters and the noise factor of microchannel plates
Author(s): Sergey P. Avdeev; Aleksandr A. Kravchenko; Evgeny Yu. Gusev; Sergey N. Petrov
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Paper Abstract

This paper presents invesigation findings of electron-beam influence on parameters and characteristics of trialcali and bialkali photocathocles of vacuum photoelectric devices and electron-beam amplification channels modification of microchannel plate image intensifier (MCP) of the electrooptical transducer. The electron-beam processing (EBP) increases total sensitivity by 10 - 12% and reduces spoilage in photocathode production to a fourth. The noise factor of MCP subjected EBP before recovery procedure MCP, reduces in 1.5 - 2.0 times, the sensibility of electrooptical transducer increases.

Paper Details

Date Published: 27 April 2007
PDF: 7 pages
Proc. SPIE 6636, 19th International Conference on Photoelectronics and Night Vision Devices, 66360K (27 April 2007); doi: 10.1117/12.742340
Show Author Affiliations
Sergey P. Avdeev, Taganrog State Univ. of Radio Engineering (Russia)
Aleksandr A. Kravchenko, Taganrog State Univ. of Radio Engineering (Russia)
Evgeny Yu. Gusev, Taganrog State Univ. of Radio Engineering (Russia)
Sergey N. Petrov, Public Corp. Kvant (Russia)


Published in SPIE Proceedings Vol. 6636:
19th International Conference on Photoelectronics and Night Vision Devices

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