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Proceedings Paper

X-ray propagation in carbon nanotubes
Author(s): P. A. Childs; S. Y. Ong; D. C. Herbert; W. I. Milne; K. B. K. Teo; N. G. Shang; L. Gangloff; A. D. Smith; A. G. O'Neill
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Paper Abstract

The maintenance of the growth of the multibillion-dollar semiconductor industry requires the development of techniques for the fabrication and characterisation of nanoscale devices. Consequently, there is great interest in photolithography techniques such as extreme UV and x-ray. Both of these techniques are extremely expensive and technologically very demanding. In this paper we describe research on the feasibility of exploiting x-ray propagation within carbon nanotubes (CNT's) for the fabrication and characterisation of nanoscale devices. This work discusses the parameters determining the design space available. To demonstrate experimentally the feasibility of x-ray propagation, arrays of carbon nanotubes have been grown on silicon membranes. The latter are required to provide structural support for the CNT's while minimising energy loss. To form a waveguide metal is deposited between the nanotubes to block x-ray transmission in this region at the same time as cladding the CNT's. The major challenge has been to fill the spaces between the CNT's with material of sufficient thickness to block x-ray transmission while maintaining the structural integrity of the CNT's. Various techniques have been employed to fill the gaps between the nanotubes including electroplating, sputtering and evaporation. This work highlights challenges encountered in optimising the process.

Paper Details

Date Published: 23 May 2007
PDF: 9 pages
Proc. SPIE 6634, International Conference on Charged and Neutral Particles Channeling Phenomena II, 66341K (23 May 2007); doi: 10.1117/12.742067
Show Author Affiliations
P. A. Childs, Univ. of Birmingham (United Kingdom)
S. Y. Ong, Univ. of Birmingham (United Kingdom)
D. C. Herbert, Univ. of Birmingham (United Kingdom)
W. I. Milne, Univ. of Cambridge (United Kingdom)
K. B. K. Teo, Univ. of Cambridge (United Kingdom)
N. G. Shang, Univ. of Cambridge (United Kingdom)
L. Gangloff, Univ. of Cambridge (United Kingdom)
A. D. Smith, CCLRC, Daresbury (United Kingdom)
A. G. O'Neill, Univ. of Newcastle (United Kingdom)


Published in SPIE Proceedings Vol. 6634:
International Conference on Charged and Neutral Particles Channeling Phenomena II

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