Share Email Print
cover

Proceedings Paper

Control charts for non-Gaussian distributions
Author(s): Florina Babus; Abdessamad Kobi; Th. Tiplica; Ioan Bacivarov; Angelica Bacivarov
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

Traditional statistical process control (SPC) techniques applied in the industrial processes field consider often that the distribution ofdata is Gaussian. The estimation ofparameters, the detection ofthe out oforder situations and the control of the followed characteristics are easy to achieve for the normal populations. In reality, whatever the origin of a characteristic (large series productions for components, mechanical parts of OE communication systems, etc. ) the curve of distributions of the measured values is generally far from being normal. The simple approximation to the Gauss distribution and the use of the classical control methods sometimes induces serious errors. In this paper, a study on the statistical control of non Gaussian populations is presented. Particularly we discuss the Rayleigh and the Weibull distribution as being representatives in (SPC for some category of data. The X control charts with variable limits are tested. Experimental simulations are presented for different parameters of the two distributions. The results confirm the methodology and encourage the research in the field of non Gaussian processes.

Paper Details

Date Published: 31 May 2007
PDF: 8 pages
Proc. SPIE 6635, Advanced Topics in Optoelectronics, Microelectronics, and Nanotechnologies III, 66350I (31 May 2007); doi: 10.1117/12.741893
Show Author Affiliations
Florina Babus, Univ. of Angers (France)
Univ. Politehnica of Bucharest (Romania)
Abdessamad Kobi, Univ. of Angers (France)
Th. Tiplica, Univ. of Angers (France)
Ioan Bacivarov, Univ. Politehnica of Bucharest (Romania)
Angelica Bacivarov, Univ. Politehnica of Bucharest (Romania)


Published in SPIE Proceedings Vol. 6635:
Advanced Topics in Optoelectronics, Microelectronics, and Nanotechnologies III

© SPIE. Terms of Use
Back to Top