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Proceedings Paper

CD-signature evaluation using scatterometry
Author(s): Jan Richter; Phillipp Laube; John Lam
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Paper Abstract

The current abilities for active feedback loops to correct for various parameters challenge metrology groups to provide exact input data for these correction cycles. One of the most important feedback loops is the one that deals with the improvement of the CD (critical dimension) uniformity of structures. Here, several processes rely on exact metrology data to tackle systematic effects that either have to be overcome by finding better process conditions or compensated actively, for instance, by tuning the writer data. Right now most of these processes tackle long range effects on the order of millimetres and do not vary a lot on the micrometer scale. On the other hand, CD measurements are usually performed with instruments that measure single points with dimensions of a couple of micrometers (such as the conventional CD-SEM). Thus noise from the micrometer scale is introduced in the global mapping of the uniformity. Recently, numerical methods, such as the exponentially weighted penalty approach called TPS (thin plate splines) have been developed that separate between the true signatures on the millimetre scale from the noise of the micrometer measurements. In this paper, we will take one step further by showing that the acquired statistically stable CD signature of a CD-SEM measurement matches the CD data measured by a scatterometer. Furthermore, we will show that the residual of the CD data of the scatterometer measurement compared to the found TPS fit has a noise level of about 0.1 nm (3σ), which essentially equals the short-term reproducibility of the tool. This is of high importance since both methods do essentially the same - they average out micrometer noise with the only difference being that TPS does it theoretically and a scatterometer does experimentally. Thus, we have the extremely fortunate situation in which theory and experiment give the same results. Hence, two separate conclusions can be drawn: the scatterometer measures indeed stable macroscopic CD signatures and TPS is indeed the right method to extract these signatures from any given CD data.

Paper Details

Date Published: 1 November 2007
PDF: 5 pages
Proc. SPIE 6730, Photomask Technology 2007, 67304R (1 November 2007); doi: 10.1117/12.741263
Show Author Affiliations
Jan Richter, Advanced Mask Technology Ctr. GmbH and Co. KG (Germany)
Phillipp Laube, Advanced Mask Technology Ctr. GmbH and Co. KG (Germany)
John Lam, n&k Technology, Inc. (United States)


Published in SPIE Proceedings Vol. 6730:
Photomask Technology 2007
Robert J. Naber; Hiroichi Kawahira, Editor(s)

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