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Proceedings Paper

Key optical technologies for experimental nanolithographer
Author(s): A. P. Zhevlakov; O. B. Danilov
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Paper Abstract

Results of research activity on development of basic technology for experimental nanolithographer with planned 10÷30 nm resolution are presented. The development circuits of illumination subsystem on base of laser produced plasma source and multimirror extreme ultraviolet reduced camera are analyzed. The manufacture technology of aspherical EUV mirrors with atomic-smooth surfaces and high-precision figure is considered. The illustrations of high-quality aspheric mirrors with supersmooth surfaces and an atomic level roughness are represented. The figure quality of 300-mm concave mirror and convex 120-mm mirrors of reduced camera measured by interferometry at &lgr; = 632 nm have been produced 0,008&lgr; rms and 0,005&lgr; rms respectively.

Paper Details

Date Published: 12 April 2007
PDF: 7 pages
Proc. SPIE 6611, Laser Optics 2006: High-Power Gas Lasers, 66110C (12 April 2007); doi: 10.1117/12.740591
Show Author Affiliations
A. P. Zhevlakov, Vavilov State Optical Institute (Russia)
O. B. Danilov, Vavilov State Optical Institute (Russia)

Published in SPIE Proceedings Vol. 6611:
Laser Optics 2006: High-Power Gas Lasers
Oleg B. Danilov, Editor(s)

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