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Proceedings Paper

An approach of auto-fix post OPC hot spots
Author(s): Ching-Heng Wang; Qingwei Liu; Liguo Zhang
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Paper Abstract

With the design rule shrinks rapidly, full chip robust Optical Proximity Correction (OPC) will definitely need longer time due to the increasing pattern density. Furthermore, to achieve a perfect OPC control recipe becomes more difficult. For, the critical dimension of the design features is deeply sub exposure wavelength, and there is only limited room for the OPC correction. Usually very complicated fragment commands need to be developed to handle the shrinking designs, which can be infinitely complicated. So when you finished debug a sophisticated fragment scripts, you still cannot promise that the script is universal for all kinds of design. So when you find some hot spot after you apply OPC correction for certain design. The only thing you can do is to modify your fragmentation script and try to re-apply OPC on this design. But considering the increasing time that is needed for applying full chip OPC nowadays, re-apply OPC will definitely prolong the tape-out time. We here demonstrate an approach, through which we can automatically fix some simple hotspots like pinch, bridging. And re-run OPC for the full chip is not necessary now. However, this work is only the early study of the auto-fix of post OPC hot spots. There is still a long way need to go to provide a perfect solution of this issue.

Paper Details

Date Published: 31 October 2007
PDF: 5 pages
Proc. SPIE 6730, Photomask Technology 2007, 67304Z (31 October 2007); doi: 10.1117/12.740406
Show Author Affiliations
Ching-Heng Wang, Semiconductor Manufacturing International Corp. (China)
Qingwei Liu, Semiconductor Manufacturing International Corp. (China)
Liguo Zhang, Mentor Graphics Corp. (China)


Published in SPIE Proceedings Vol. 6730:
Photomask Technology 2007
Robert J. Naber; Hiroichi Kawahira, Editor(s)

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