Share Email Print
cover

Proceedings Paper

Picosecond time-resolved XAFS measurements using femtosecond laser-produced plasma soft x-ray as a probe
Author(s): Hidetoshi Nakano; Katsuya Oguri; Yasuaki Okano; Tadashi Nishikawa
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Abstract

We have demonstrated the sub-10-ps time-resolved measurement of the x-ray absorption fine structure (XAFS) in laser-excited Si foil by using a femtosecond laser-produced plasma soft x-ray as a probe. We observed a rapid change and recovery in the absorption structure near its LII,III edge induced by 100-fs laser pulse irradiation when the laser intensity was in the 109-1010 W/cm2 range. When the incident laser intensity was of the order of 1012 W/cm2, which is higher than the damage threshold, the extended x-ray absorption fine structure (EXAFS) signals clearly revealed inter atomic distance expansion and structural disordering as well as a change in the electronic structure caused by the production of liquid Si. We also describe our recent results on spatio-temporally resolved soft x-ray absorption in an expanding ablated particle cloud from aluminum that was heated with a 1014-W/cm2, 100-fs laser pulse by using an imaging system for time-resolved soft x-ray absorption spectroscopy.

Paper Details

Date Published: 15 May 2007
PDF: 10 pages
Proc. SPIE 6614, Laser Optics 2006: Superintense Light Fields and Ultrafast Processes, 661409 (15 May 2007); doi: 10.1117/12.740195
Show Author Affiliations
Hidetoshi Nakano, Nippon Telegraph and Telephone Corp. (Japan)
Katsuya Oguri, Nippon Telegraph and Telephone Corp. (Japan)
Yasuaki Okano, Nippon Telegraph and Telephone Corp. (Japan)
Tadashi Nishikawa, Nippon Telegraph and Telephone Corp. (Japan)


Published in SPIE Proceedings Vol. 6614:
Laser Optics 2006: Superintense Light Fields and Ultrafast Processes

© SPIE. Terms of Use
Back to Top