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Proceedings Paper

Excimer-laser-driven EUV plasma source for one-shot one-pattern projection microlithography
Author(s): P. Di Lazzaro; G. Altieri; D. Amodio; S. Bollanti; A. Conti; F. Flora; T. Letardi; L. Mezi; D. Murra; E. Tefouet Kana; A. Torre; C. E. Zheng
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Paper Abstract

We present the design elements and the preliminary experimental results of an Extreme-UltraViolet (EUV) exposure tool driven by the high-output-energy excimer laser-facility Hercules, which is aimed at printing a sub-100-nm-pattern on a photoresist in a single-shot irradiation.

Paper Details

Date Published: 26 April 2007
PDF: 6 pages
Proc. SPIE 6346, XVI International Symposium on Gas Flow, Chemical Lasers, and High-Power Lasers, 63460M (26 April 2007); doi: 10.1117/12.738084
Show Author Affiliations
P. Di Lazzaro, ENEA Frascati Research Ctr. (Italy)
G. Altieri, ENEA (Italy)
D. Amodio, ENEA (Italy)
S. Bollanti, ENEA Frascati Research Ctr. (Italy)
A. Conti, ENEA (Italy)
F. Flora, ENEA Frascati Research Ctr. (Italy)
T. Letardi, ENEA (Italy)
L. Mezi, ENEA Frascati Research Ctr. (Italy)
D. Murra, ENEA Frascati Research Ctr. (Italy)
E. Tefouet Kana, El. En. SpA (Italy)
A. Torre, ENEA Frascati Research Ctr. (Italy)
C. E. Zheng, El. En. SpA (Italy)


Published in SPIE Proceedings Vol. 6346:
XVI International Symposium on Gas Flow, Chemical Lasers, and High-Power Lasers

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