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Proceedings Paper

Development of a MWIR polarimetric FPA
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Paper Abstract

Past work with polarimetry in the mid-wave infrared (MWIR) has yielded mixed results. In order to better characterize polarimetric content in the MWIR and short-wave infrared (SWIR) atmospheric windows, we are developing focal plane array (FPA) technology that will address shortcomings in earlier devices. In particular, our efforts are focusing on placing micro-polarizing grids in very close proximity to the P-N junction of the detector. By placing these micropolarizers very close to the photodetector junction, the opportunity for polarimetric cross talk between pixels is minimized. CE's unique process for fabricating FPAs is well suited for implementing this approach. Since a polarimetric FPA consisting of a standard FPA and micro-wire grid polarizers reduces the effective FPA format by a factor of two in both dimensions, the ability to produce extremely large format FPAs are critical to obtain high resolution polarimetric imagery. CE's FPA fabrication process is also highly scalable and has successfully fabricated FPAs as large as 2k by 2k. This paper describes the progress we've made towards developing these unique polarimetric FPAs.

Paper Details

Date Published: 12 September 2007
PDF: 10 pages
Proc. SPIE 6660, Infrared Systems and Photoelectronic Technology II, 666007 (12 September 2007); doi: 10.1117/12.737777
Show Author Affiliations
David P. Forrai, L-3 Communications Cincinnati Electronics (United States)
Darrel W. Endres, L-3 Communications Cincinnati Electronics (United States)
John W. Devitt, L-3 Communications Cincinnati Electronics (United States)
Andrew M. Sarangan, Univ. of Dayton (United States)
Qiwen Zhan, Univ. of Dayton (United States)
Aziz Mahfoud-Familia, Univ. of Dayton (United States)
Robert T. Mack, Air Force Research Lab. (United States)
James S. Harris, Air Force Research Lab. (United States)

Published in SPIE Proceedings Vol. 6660:
Infrared Systems and Photoelectronic Technology II
Eustace L. Dereniak; Randolph E. Longshore; John P. Hartke; Ashok K. Sood, Editor(s)

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