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Proceedings Paper

Fast near field simulation of optical and EUV masks using the waveguide method
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Paper Abstract

A new and optimized waveguide based electromagnetic field solver for optical and EUV mask simulations is presented. After an introduction of the waveguide method, the convergence and speed optimization and the adaptation of the method to optical and EUV lithography mask simulations are presented. Additionally a model for the simulation of EUV multilayer defects and an optimized decomposition technique for three dimensional waveguide simulations enabling very fast computations as well as large mask area simulations is presented. Subsequently the capabilities of the new electromagnetic field solver are demonstrated exemplarily based on state-of-the-art optical and EUV masks.

Paper Details

Date Published: 3 May 2007
PDF: 12 pages
Proc. SPIE 6533, 23rd European Mask and Lithography Conference, 65330Y (3 May 2007); doi: 10.1117/12.736978
Show Author Affiliations
Peter Evanschitzky, Fraunhofer Institute Integrated Systems and Device Technology (Germany)
Andreas Erdmann, Fraunhofer Institute Integrated Systems and Device Technology (Germany)

Published in SPIE Proceedings Vol. 6533:
23rd European Mask and Lithography Conference
Uwe F. W. Behringer, Editor(s)

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