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Proceedings Paper

First measurement data obtained on the new Vistec LMS IPRO4
Author(s): Dieter Adam; Artur Boesser; Michael Heiden; Jochen Bender; Frank Laske; Klaus-Dieter Röth
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Paper Abstract

The development of reticles for the 65nm node is already completed and development is ongoing at the leading edge mask shops for 45nm technology node reticles. The specifications for 45 nm node reticles CD homogeneity, CD mean to target, and registration (Overlay) are much tighter than previous generation reticles. As a result of the new requirements new metrology systems will be required which provide significantly improved measurement performance compared to currently available systems. The Vistec LMS IPRO4 is the new generation registration metrology system under final development. Initial performance data of the alpha tool is reported and the planned major hardware and software improvements are described.

Paper Details

Date Published: 3 May 2007
PDF: 7 pages
Proc. SPIE 6533, 23rd European Mask and Lithography Conference, 65330I (3 May 2007); doi: 10.1117/12.736972
Show Author Affiliations
Dieter Adam, Vistec Semiconductor Systems GmbH (Germany)
Artur Boesser, Vistec Semiconductor Systems GmbH (Germany)
Michael Heiden, Vistec Semiconductor Systems GmbH (Germany)
Jochen Bender, Vistec Semiconductor Systems GmbH (Germany)
Frank Laske, Vistec Semiconductor Systems GmbH (Germany)
Klaus-Dieter Röth, Vistec Semiconductor Systems GmbH (Germany)

Published in SPIE Proceedings Vol. 6533:
23rd European Mask and Lithography Conference
Uwe F. W. Behringer, Editor(s)

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