Share Email Print

Proceedings Paper

Achieving mask order processing automation, interoperability and standardization based on P10
Author(s): B. Rodriguez; O. Filies; D. Sadran; Michel Tissier; D. Albin; S. Stavroulakis; E. Voyiatzis
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

Last year the MUSCLE (Masks through User's Supply Chain: Leadership by Excellence) project was presented. Here is the project advancement. A key process in mask supply chain management is the exchange of technical information for ordering masks. This process is large, complex, company specific and error prone, and leads to longer cycle times and higher costs due to missing or wrong inputs. Its automation and standardization could produce significant benefits. We need to agree on the standard for mandatory and optional parameters, and also a common way to describe parameters when ordering. A system was created to improve the performance in terms of Key Performance Indicators (KPIs) such as cycle time and cost of production. This tool allows us to evaluate and measure the effect of factors, as well as the effect of implementing the improvements of the complete project. Next, a benchmark study and a gap analysis were performed. These studies show the feasibility of standardization, as there is a large overlap in requirements. We see that the SEMI P10 standard needs enhancements. A format supporting the standard is required, and XML offers the ability to describe P10 in a flexible way. Beyond using XML for P10, the semantics of the mask order should also be addressed. A system design and requirements for a reference implementation for a P10 based management system are presented, covering a mechanism for the evolution and for version management and a design for P10 editing and data validation.

Paper Details

Date Published: 3 May 2007
PDF: 10 pages
Proc. SPIE 6533, 23rd European Mask and Lithography Conference, 65330V (3 May 2007); doi: 10.1117/12.736964
Show Author Affiliations
B. Rodriguez, Clercq Engineering BVBA (Belgium)
O. Filies, Infineon Technologies AG (Germany)
D. Sadran, Photomasks France SAS (France)
Michel Tissier, Photomasks France SAS (France)
D. Albin, Atmel Corp. (France)
S. Stavroulakis, Photronics Hellas S.A. (Greece)
E. Voyiatzis, Photronics Hellas S.A. (Greece)

Published in SPIE Proceedings Vol. 6533:
23rd European Mask and Lithography Conference

© SPIE. Terms of Use
Back to Top