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Proceedings Paper

Challenges of residual layer minimisation in thermal nanoimprint lithography
Author(s): Nicolas Bogdanski; Matthias Wissen; Saskia Möllenbeck; Hella-Christin Scheer
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Paper Abstract

When minimal residual layers are aimed at in the field of thermal imprint lithography (T-NIL) 'partial cavity filling' offers a promising method to succeed. There, a filling of any of the cavities a stamp provides is avoided by a reduction of the initial layer thickness. Due to this unusual procedure, some challenges evolve during the imprint of complex types of structures. We report about effects that go along with partial cavity filling like physical self assembly and recovery. Furthermore we will give some suggestions how they may be reduced or even can be avoided.

Paper Details

Date Published: 3 May 2007
PDF: 6 pages
Proc. SPIE 6533, 23rd European Mask and Lithography Conference, 65330Q (3 May 2007); doi: 10.1117/12.736926
Show Author Affiliations
Nicolas Bogdanski, Univ. of Wuppertal (Germany)
Matthias Wissen, Univ. of Wuppertal (Germany)
Saskia Möllenbeck, Univ. of Wuppertal (Germany)
Hella-Christin Scheer, Univ. of Wuppertal (Germany)

Published in SPIE Proceedings Vol. 6533:
23rd European Mask and Lithography Conference
Uwe F. W. Behringer, Editor(s)

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