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Proceedings Paper

Resist and BARC outgassing measured by TD-GCMS: investigation during the exposure or the bake steps of the lithographic process
Author(s): Raluca Tiron; Claire Sourd; Hervé Fontaine; Sylviane Cetre; Bénédicte Mortini
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Paper Abstract

In this paper we develop a methodology in order to monitor the organic outgassing level of BARC and resist materials, during the exposure or bake steps of the lithographic process. We present two different approaches, both based on thermal desorption-gas chromatography/mass spectrometry (TD-GC/MS) techniques. First we used an indirect method to monitor the byproducts outgassed during the exposure step. Secondly we check with an in-situ measurement the outgassing behaviour as a function of bake conditions. These two approaches are illustrated using different resist and BARC formulations. Finally, TD-GC-MS technique is integrated in a largest outgassing evaluation protocol, and results obtained by this technique are correlated with other characterization methods such as TGA, FTIR and defectivity monitoring.

Paper Details

Date Published: 3 May 2007
PDF: 9 pages
Proc. SPIE 6533, 23rd European Mask and Lithography Conference, 65331E (3 May 2007); doi: 10.1117/12.736532
Show Author Affiliations
Raluca Tiron, CEA, LETI (France)
Claire Sourd, CEA, LETI (France)
Hervé Fontaine, CEA, LETI (France)
Sylviane Cetre, CEA, LETI (France)
Bénédicte Mortini, STMicroelectronics (France)


Published in SPIE Proceedings Vol. 6533:
23rd European Mask and Lithography Conference

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