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Proceedings Paper

A complete set of the special process equipment for the defect-free production of reticles
Author(s): Syarhei Avakaw; Valerian Iouditski; Leanid Pushkin; Alena Tsitko
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Paper Abstract

The paper presents an integrated solution of a problem to develop a set of the equipment for the defect-free production of reticles and photomasks. The integrated approach to the equipment design allows to obtain certain advantages disclosed below. Accordingly, the paper highlights the following main issues: *Practical realization of these advantages in the special process equipment developed by the KBTEM-OMO enterprise of the PLANAR. *Advantages in the development of a complete set of the special process equipment; Without taking into account technical and chemical processes, this complete set includes three component parts: *Multi-beam laser pattern generator; *Die-to-Database reticle inspection system; *Laser reticle repair system.

Paper Details

Date Published: 3 May 2007
PDF: 9 pages
Proc. SPIE 6533, 23rd European Mask and Lithography Conference, 65331B (3 May 2007); doi: 10.1117/12.736525
Show Author Affiliations
Syarhei Avakaw, KBTEM-OMO of Planar (Belarus)
Valerian Iouditski, KBTEM-OMO of Planar (Belarus)
Leanid Pushkin, KBTEM-OMO of Planar (Belarus)
Alena Tsitko, KBTEM-OMO of Planar (Belarus)


Published in SPIE Proceedings Vol. 6533:
23rd European Mask and Lithography Conference
Uwe F. W. Behringer, Editor(s)

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