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Proceedings Paper

A microstitching interferometer for evaluating the surface profile of precisely figured x-ray K-B mirrors
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Paper Abstract

Fabrication and evaluation of elliptical X-ray mirrors, such as Kirkpatrick-Baez (K-B) mirrors produced by the profile-coating technique, requires accurate surface figure measurements over a wide range of spatial frequencies. Microstitching interferometry has proven to fulfill this requirement for length scales from a few μm up to the full mirror length. At the Advanced Photon Source, a state-of-the-art microroughness microscope interferometer that incorporates advanced microstitching capability has been used to obtain measurements of profile-coated elliptical K-B mirrors. The stitched surface height data provide previously unattainable resolution and reproducibility, which has facilitated the fabrication of ultrasmooth (< 1 nm rms residual height) profile-coated mirrors, whose hard X-ray focusing performance is expected to approach the diffraction limit. This paper describes the system capabilities and limitations. Results of measurements obtained with it will be discussed and compared with those obtained with the Long Trace Profiler.

Paper Details

Date Published: 1 October 2007
PDF: 11 pages
Proc. SPIE 6704, Advances in Metrology for X-Ray and EUV Optics II, 670406 (1 October 2007); doi: 10.1117/12.736384
Show Author Affiliations
Lahsen Assoufid, Argonne National Lab. (United States)
Jun Qian, Argonne National Lab. (United States)
Cameron M. Kewish, Argonne National Lab. (United States)
Chian Liu, Argonne National Lab. (United States)
Ray Conley, Argonne National Lab. (United States)
Albert T. Macrander, Argonne National Lab. (United States)
Delvin Lindley, KLA-Tencor (United States)
Christopher Saxer, KLA-Tencor (United States)


Published in SPIE Proceedings Vol. 6704:
Advances in Metrology for X-Ray and EUV Optics II
Lahsen Assoufid; Peter Z. Takacs; Masaru Ohtsuka, Editor(s)

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