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Proceedings Paper

Multilayer growth in the APS rotary deposition system
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Paper Abstract

We report our progress in the growth of periodic and depth-graded multilayers in the APS rotary deposition system, a machine designed for fabrication of films tens of microns thick with thousands of layers. A computational method was employed to design depth-graded multilayers for use as wide-angular bandpass reflective optics. We present experimental results for a 154-layer WSi2/Si multilayer system with bilayer thickness ranging from 2.2 nm to 5.5 nm that closely match theoretical flat-top reflectivity predictions of 9.8% from 15.6 mrad to 23.3 mrad at 8 keV.

Paper Details

Date Published: 20 September 2007
PDF: 7 pages
Proc. SPIE 6705, Advances in X-Ray/EUV Optics and Components II, 670505 (20 September 2007); doi: 10.1117/12.736024
Show Author Affiliations
Ray Conley, Argonne National Lab. (United States)
Chian Liu, Argonne National Lab. (United States)
Cameron M. Kewish, Argonne National Lab. (United States)
Albert T. Macrander, Argonne National Lab. (United States)
Christian Morawe, European Synchrotron Radiation Facility (France)

Published in SPIE Proceedings Vol. 6705:
Advances in X-Ray/EUV Optics and Components II
Ali M. Khounsary; Christian Morawe; Shunji Goto, Editor(s)

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