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Proceedings Paper

Plasmon assisted photonic crystal quantum dot sensors
Author(s): R. V. Shenoi; D. A. Ramirez; Y. Sharma; R. S. Attaluri; J. Rosenberg; O. J. Painter; S. Krishna
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Paper Abstract

We report Quantum Dot Infrared Detectors (QDIP) where light coupling to the self assembled quantum dots is achieved through plasmons occurring at the metal-semiconductor interface. The detector structure consists of an asymmetric InAs/InGaAs/GaAs dots-in-a-well (DWELL) structure and a thick layer of GaAs sandwiched between two highly doped n-GaAs contact layers, grown on a semi-insulating GaAs substrate. The aperture of the detector is covered with a thin metallic layer which along with the dielectric layer confines light in the vertical direction. Sub-wavelength two-dimensional periodic patterns etched in the metallic layer covering the aperture of the detector and the active region creates a micro-cavity that concentrate light in the active region leading to intersubband transitions between states in the dot and the ones in the well. The sidewalls of the detector were also covered with metal to ensure that there is no leakage of light into the active region other than through the metal covered aperture. An enhanced spectral response when compared to the normal DWELL detector is obtained despite the absence of any aperture in the detector. The spectral response measurements show that the Long Wave InfraRed (LWIR) region is enhanced when compared to the Mid Wave InfraRed (MWIR) region. This may be due to coupling of light into the active region by plasmons that are excited at the metal-semiconductor interface. The patterned metal-dielectric layers act as an optical resonator thereby enhancing the coupling efficiency of light into the active region at the specified frequency. The concept of plasmon-assisted coupling is in principle technology agnostic and can be easily integrated into present day infrared sensors.

Paper Details

Date Published: 26 September 2007
PDF: 6 pages
Proc. SPIE 6713, Nanophotonics and Macrophotonics for Space Environments, 67130P (26 September 2007); doi: 10.1117/12.735724
Show Author Affiliations
R. V. Shenoi, Ctr. for High Technology Materials, Univ. of New Mexico (United States)
D. A. Ramirez, Ctr. for High Technology Materials, Univ. of New Mexico (United States)
Y. Sharma, Ctr. for High Technology Materials, Univ. of New Mexico (United States)
R. S. Attaluri, Ctr. for High Technology Materials, Univ. of New Mexico (United States)
J. Rosenberg, California Institute of Technology (United States)
O. J. Painter, California Institute of Technology (United States)
S. Krishna, Ctr. for High Technology Materials, Univ. of New Mexico (United States)


Published in SPIE Proceedings Vol. 6713:
Nanophotonics and Macrophotonics for Space Environments
Edward W. Taylor; David A. Cardimona, Editor(s)

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