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Proceedings Paper

Characterizing dielectric tensors from angle-of-incidence Mueller matrix images
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Paper Abstract

Biaxial ellipsometry is a technique that measures the dielectric tensor and thickness of a biaxial substrate, single-layer thin film, or multi-layer structure. The dielectric tensor of a biaxial material consists of the real and imaginary parts of the three orthogonal principal indices (nx+ ikx, ny+ iky and nz + ikz) and three Euler angles (Θ, Φ, Δ) to describe its orientation. The method utilized in this work measures an angle-of-incidence Mueller matrix from a Mueller matrix imaging polarimeter equipped with a pair of microscope objectives with low polarization aberrations. The dielectric tensors for multilayer samples are determined from multi-spectral angle-of-incidence Mueller matrix images in either a transmission or reflection mode using an appropriate dispersion model. Given approximate a priori knowledge of the dielectric tensor and film thickness, a Jones matrix image is first calculated by solving Maxwell's equations at each surface which is then transformed into a Mueller matrix image. An optimization algorithm then finds the best fit dielectric tensor based on matching the measured and calculated angle-of-incidence Mueller matrix images. One use for this application is to more accurately determine the dielectric tensors of biaxial films used in liquid crystal displays.

Paper Details

Date Published: 13 September 2007
PDF: 11 pages
Proc. SPIE 6682, Polarization Science and Remote Sensing III, 66820N (13 September 2007); doi: 10.1117/12.735335
Show Author Affiliations
Paula K. Smith, College of Optical Sciences, The Univ. of Arizona (United States)
Russell A. Chipman, College of Optical Sciences, The Univ. of Arizona (United States)

Published in SPIE Proceedings Vol. 6682:
Polarization Science and Remote Sensing III
Joseph A. Shaw; J. Scott Tyo, Editor(s)

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