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Proceedings Paper

Robust antireflection coatings By UV cross-linking of silica nanoparticles and diazo-resin polycation
Author(s): Jason I. Ridley; James R. Heflin; Alfred L. Ritter
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Paper Abstract

Antireflection coatings have been fabricated by self-assembly using silica nanoparticles. The ionic self-assembled multilayer (ISAM) films are tightly packed and homogeneous. While the geometric properties of a matrix of spherical particles with corresponding void interstices are highly suitable to meet the conditions for minimal reflectivity, it is also a cause for the lack of cohesion within the constituent body, as well as to the substrate surface. This study investigates methods for improving the interconnectivity of the nanoparticle structure. One such method involves UV curing of diazo-resin (DAR)/silica nanoparticle films, thereby converting the ionic interaction into a stronger covalent bond. Factorial analysis and response surface methods are incorporated to determine factors that affect film properties, and to optimize their optical and adhesive capabilities. The second study looks at the adhesive strength of composite multilayer films. Films are fabricated with silica nanoparticles and poly(allylamine hydrochloride) (PAH), and dipped into aqueous solutions of PAH and poly(methacrylic acid, sodium salt) (PMA) to improve cohesion of silica nanoparticles in the matrix, as well as binding strength to the substrate surface. The results of the two studies are discussed.

Paper Details

Date Published: 21 September 2007
PDF: 9 pages
Proc. SPIE 6674, Thin-Film Coatings for Optical Applications IV, 667406 (21 September 2007); doi: 10.1117/12.734515
Show Author Affiliations
Jason I. Ridley, Virginia Polytechnic Institute and State Univ. (United States)
James R. Heflin, Virginia Polytechnic Institute and State Univ. (United States)
Alfred L. Ritter, Virginia Polytechnic Institute and State Univ. (United States)

Published in SPIE Proceedings Vol. 6674:
Thin-Film Coatings for Optical Applications IV
Michael J. Ellison, Editor(s)

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