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Proceedings Paper

The new ESRF multilayer deposition facility
Author(s): Ch. Morawe; Ch. Borel; J.-Ch. Peffen
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Paper Abstract

Recently, the ESRF Optics Group installed a new multilayer deposition facility. This upgrade was motivated by increasingly demanding requirements for multilayer based x-ray optics on modern 3rd generation synchrotron beamlines. Improved accuracy, stability, and reproducibility are key issues. The deposition process is based on non-reactive magnetron sputtering. The machine is equipped with four cathodes and one ion source for surface treatment. Conducting, insulating, and ferromagnetic materials can be deposited. A linear substrate motion will enable coatings up to 100 cm long and 15 cm wide. The talk will describe the basic concept of the machine and will give an overview of the operating conditions. Initial coating results will complement the presentation.

Paper Details

Date Published: 20 September 2007
PDF: 11 pages
Proc. SPIE 6705, Advances in X-Ray/EUV Optics and Components II, 670504 (20 September 2007); doi: 10.1117/12.734107
Show Author Affiliations
Ch. Morawe, European Synchrotron Radiation Facility (France)
Ch. Borel, European Synchrotron Radiation Facility (France)
J.-Ch. Peffen, European Synchrotron Radiation Facility (France)


Published in SPIE Proceedings Vol. 6705:
Advances in X-Ray/EUV Optics and Components II
Ali M. Khounsary; Christian Morawe; Shunji Goto, Editor(s)

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