Share Email Print
cover

Proceedings Paper

Hard x-ray wavefront measurement and control for hard x-ray nanofocusing
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

Extremely high surface figure accuracy is required for hard x-ray nanofocusing mirrors to realize an ideal spherical wavefront in a reflected x-ray beam. We performed the figure correction of an elliptically figured mirror by a differential deposition technique on the basis of the wavefront phase error, which was calculated by a phase-retrieval method using only intensity profile on the focal plane. The measurements of the intensity profiles were performed at the 1-km-long beamline at SPring-8. The two measurements before and after the figure correction indicate that the beamwaist structure around the focal point is greatly improved.

Paper Details

Date Published: 1 October 2007
PDF: 8 pages
Proc. SPIE 6704, Advances in Metrology for X-Ray and EUV Optics II, 670404 (1 October 2007); doi: 10.1117/12.733749
Show Author Affiliations
Soichiro Handa, Osaka Univ. (Japan)
Hidekazu Mimura, Osaka Univ. (Japan)
Satoshi Matsuyama, Osaka Univ. (Japan)
Hirokatsu Yumoto, Osaka Univ. (Japan)
SPring-8/Japan Synchrotron Radiation Research Institute (Japan)
Takashi Kimura, Osaka Univ. (Japan)
Yasuhisa Sano, Osaka Univ. (Japan)
Kenji Tamasaku, SPring-8/RIKEN (Japan)
Yoshinori Nishino, SPring-8/RIKEN (Japan)
Makina Yabashi, SPring-8/Japan Synchrotron Radiation Research Institute (Japan)
Tetsuya Ishikawa, SPring-8/RIKEN (Japan)
Kazuto Yamauchi, Osaka Univ. (Japan)


Published in SPIE Proceedings Vol. 6704:
Advances in Metrology for X-Ray and EUV Optics II
Lahsen Assoufid; Peter Z. Takacs; Masaru Ohtsuka, Editor(s)

© SPIE. Terms of Use
Back to Top