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Proceedings Paper

The research of oblique deposition of lanthanum fluoride thin films at 193nm
Author(s): Ming-Chung Liu; Bo-Huei Liao; Wen-Hao Cho; Cheng-Chung Lee; Cheng-Chung Jaing
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Paper Abstract

Oblique deposition of lanthanum fluoride thin films was prepared by thermal resistance evaporation. The characteristics (including microstructure, coefficient of tangent rule, birefringence at 193nm and stress) of lanthanum fluoride thin films of have been investigated. The deposition angles increased from 20 to 70 degree, the coefficient of tangent rule decreased from 0.7 to 0.37. When the deposition angles larger than 60 degree, the coefficient held a constant, 0.37. The refractive index at 193nm of oblique deposition films decreased with the deposition angles was larger than 40 degree. The residual stress of films achieved the minimum value at 20-degree deposition angle.

Paper Details

Date Published: 11 September 2007
PDF: 8 pages
Proc. SPIE 6645, Nanoengineering: Fabrication, Properties, Optics, and Devices IV, 66451Y (11 September 2007); doi: 10.1117/12.733616
Show Author Affiliations
Ming-Chung Liu, National Central Univ. (Taiwan)
Bo-Huei Liao, National Central Univ. (Taiwan)
Wen-Hao Cho, National Central Univ. (Taiwan)
Cheng-Chung Lee, National Central Univ. (Taiwan)
Cheng-Chung Jaing, Minghsin Univ. of Science and Technology (Taiwan)


Published in SPIE Proceedings Vol. 6645:
Nanoengineering: Fabrication, Properties, Optics, and Devices IV
Elizabeth A. Dobisz; Louay A. Eldada, Editor(s)

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