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Proceedings Paper

A gas barrier film composed of SiO2/Al2O3 multilayers on flexible substrates
Author(s): Jung-Yu Liao; Pei-Ching Liu; Yu-Hsin Yeh; Mei-Rurng Tseng
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Paper Abstract

A gas barrier film composed of SiO2/Al2O3 multilayers on flexible PEN and PI substrates is studied. The multilayers are obtained by stacking six SiO2/Al2O3 pairs utilizing the RF sputtering, and each layer is about 60 nm in thickness. The barrier performances are further identified by the accelerated transparent Ca tests we proposed and the OLED lifetime tests. The water vapor transmission rates (WVTR) of the gas barrier films are calculated to be 5.05×10-3 at 85°C/85%RH and 9.5×10-6 at 20°C/60%RH, respectively. The decay rate in the Ca test at 85°C/85%RH is approximately 531 times faster than that at 20°C/60%RH. The half lifetime of the OLED with the multilayers gas barrier as the substrate lasts as long as the device using the glass substrate, which shows the feasibility of fabricating a thin film encapsulated OLED.

Paper Details

Date Published: 16 October 2007
PDF: 6 pages
Proc. SPIE 6655, Organic Light Emitting Materials and Devices XI, 66551O (16 October 2007); doi: 10.1117/12.733500
Show Author Affiliations
Jung-Yu Liao, Industrial Technology Research Institute (Taiwan)
Pei-Ching Liu, Industrial Technology Research Institute (Taiwan)
Yu-Hsin Yeh, Industrial Technology Research Institute (Taiwan)
Mei-Rurng Tseng, Industrial Technology Research Institute (Taiwan)

Published in SPIE Proceedings Vol. 6655:
Organic Light Emitting Materials and Devices XI
Zakya H. Kafafi; Franky So, Editor(s)

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