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Proceedings Paper

Microstitching interferometer and relative angle determinable stitching interferometer for half-meter-long x-ray mirror
Author(s): Haruhiko Ohashi; Takashi Tsumura; Hiromi Okada; Hidekazu Mimura; Tatsuhiko Masunaga; Yasunori Senba; Shunji Goto; Kazuto Yamauchi; Tetsuya Ishikawa
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Paper Abstract

A surface profiler system with a high accuracy of the order of nanometers has been developed for a half-meter-long X-ray mirror. This system is based on microstitching interferometer (MSI) and relative angle determinable stitching interferometer (RADSI). Using elastic hinges and linear actuators, we designed the 5-axis- and 6-axis stages for the MSI and RADSI, respectively, for the half-meter-long X-ray mirror. A test mirror of length 0.5 m was used to measure the height accuracy (1.4 nm in rms) and lateral resolution (36 μm) of the proposed system.

Paper Details

Date Published: 1 October 2007
PDF: 8 pages
Proc. SPIE 6704, Advances in Metrology for X-Ray and EUV Optics II, 670405 (1 October 2007); doi: 10.1117/12.733476
Show Author Affiliations
Haruhiko Ohashi, Japan Synchrotron Radiation Research Institute/SPring-8 (Japan)
Takashi Tsumura, JTEC Corp. (Japan)
Hiromi Okada, JTEC Corp. (Japan)
Hidekazu Mimura, Osaka Univ. (Japan)
Tatsuhiko Masunaga, JTEC Corp. (Japan)
Yasunori Senba, Japan Synchrotron Radiation Research Institute/SPring-8 (Japan)
Shunji Goto, Japan Synchrotron Radiation Research Institute/SPring-8 (Japan)
Kazuto Yamauchi, Osaka Univ. (Japan)
Tetsuya Ishikawa, Japan Synchrotron Radiation Institute (Japan)
RIKEN-SPring-8 Ctr. (Japan)


Published in SPIE Proceedings Vol. 6704:
Advances in Metrology for X-Ray and EUV Optics II
Lahsen Assoufid; Peter Z. Takacs; Masaru Ohtsuka, Editor(s)

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