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Proceedings Paper

Interferometric lithography with sub-100-nm resolution using a tabletop 46.9-nm laser
Author(s): P. W. Wachulak; D. Patel; M. G. Capeluto; C. S. Menoni; J. J. Rocca; M. C. Marconi
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Paper Abstract

Combining a compact table top soft X ray laser with an interferometric lithography set up arrays of nanodots and nanoholes were directly patterned on the surface of different photoresists. Multiple exposures with a Lloyd's mirror interferometer printed arrays of holes and dots over an area of 0.5× 0.5 mm2 with typical diameters down to 60 nm full width at half maximum. This laser-based soft X-ray interferometric tool demonstrated the possibility to print different nanoscale patterns using a compact table-top set up.

Paper Details

Date Published: 11 October 2007
PDF: 5 pages
Proc. SPIE 6702, Soft X-Ray Lasers and Applications VII, 67020I (11 October 2007); doi: 10.1117/12.732900
Show Author Affiliations
P. W. Wachulak, Colorado State Univ. (United States)
D. Patel, Colorado State Univ. (United States)
M. G. Capeluto, Univ. de Buenos Aires (Argentina)
C. S. Menoni, Colorado State Univ. (United States)
J. J. Rocca, Colorado State Univ. (United States)
M. C. Marconi, Colorado State Univ. (United States)


Published in SPIE Proceedings Vol. 6702:
Soft X-Ray Lasers and Applications VII
Gregory J. Tallents; James Dunn, Editor(s)

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