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Proceedings Paper

Proposal for a universal test mirror for characterization of slope measuring instruments
Author(s): Valeriy V. Yashchuk; Wayne R. McKinney; Tony Warwick; Tino Noll; Frank Siewert; Thomas Zeschke; Ralf D. Geckeler
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Paper Abstract

The development of third generation light sources like the Advanced Light Source (ALS) or BESSY II brought to a focus the need for high performance synchrotron optics with unprecedented tolerances for slope error and micro roughness. Proposed beam lines at Free Electron Lasers (FEL) require optical elements up to a length of one meter, characterized by a residual slope error in the range of 0.1 μrad (rms), and rms values of 0.1 nm for micro roughness. These optical elements must be inspected by highly accurate measuring instruments, providing a measurement uncertainty lower than the specified accuracy of the surface under test. It is essential that metrology devices in use at synchrotron laboratories be precisely characterized and calibrated to achieve this target. In this paper we discuss a proposal for a Universal Test Mirror (UTM) as a realization of a high performance calibration instrument. The instrument would provide an ideal calibration surface to replicate a redundant surface under test of redundant figure. The application of a sophisticated calibration instrument will allow the elimination of the majority of the systematic error from the error budget of an individual measurement of a particular optical element. We present the limitations of existing methods, initial UTM design considerations, possible calibration algorithms, and an estimation of the expected accuracy.

Paper Details

Date Published: 20 September 2007
PDF: 12 pages
Proc. SPIE 6704, Advances in Metrology for X-Ray and EUV Optics II, 67040A (20 September 2007); doi: 10.1117/12.732719
Show Author Affiliations
Valeriy V. Yashchuk, Lawrence Berkeley National Lab. (United States)
Wayne R. McKinney, Lawrence Berkeley National Lab. (United States)
Tony Warwick, Lawrence Berkeley National Lab. (United States)
Tino Noll, BESSY GmbH (Germany)
Frank Siewert, BESSY GmbH (Germany)
Thomas Zeschke, BESSY GmbH (Germany)
Ralf D. Geckeler, Physikalisch-Technische Bundesanstalt Braunschweig (Germany)

Published in SPIE Proceedings Vol. 6704:
Advances in Metrology for X-Ray and EUV Optics II
Lahsen Assoufid; Peter Z. Takacs; Masaru Ohtsuka, Editor(s)

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