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Proceedings Paper

Simultaneous measurements of thin-film thickness and refractive index by dispersive white-light interferometry
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Paper Abstract

A dispersive method of white-light interferometry for measuring the tomographical thickness profile of a thin-film layer through a Fourier-transform analysis of a spectrally-resolved interference signal is proposed. The refractive index is also determined without prior knowledge of the geometrical thickness of the film layer. In contrast with standard white-light scanning interferometry, dispersive white-light interferometry generates the spectral distribution of interferograms directly by means of dispersive optics without mechanical depth scanning. Therefore, the proposed method in this paper is well suited for in-line 3-D inspection of dielectric thin-film layers, particularly for the semiconductor and flat-panel display industry, with high immunity to external vibration and high measurement speed.

Paper Details

Date Published: 14 September 2007
PDF: 8 pages
Proc. SPIE 6674, Thin-Film Coatings for Optical Applications IV, 667402 (14 September 2007); doi: 10.1117/12.732311
Show Author Affiliations
Young-Sik Ghim, Korea Advanced Institute of Science and Technology (South Korea)
Joonho You, Korea Advanced Institute of Science and Technology (South Korea)
Seung-Woo Kim, Korea Advanced Institute of Science and Technology (South Korea)


Published in SPIE Proceedings Vol. 6674:
Thin-Film Coatings for Optical Applications IV
Michael J. Ellison, Editor(s)

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