Share Email Print
cover

Proceedings Paper

CO2 laser-produced Sn plasma as the solution for high-volume manufacturing EUV lithography
Author(s): Akira Endo; Tamotsu Abe; Hideo Hoshino; Yoshifumi Ueno; Masaki Nakano; Takeshi Asayama; Hiroshi Komori; Georg Soumagne; Hakaru Mizoguchi; Akira Sumitani; Koichi Toyoda
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

We are developing a laser produced plasma light source for high volume manufacturing (HVM) EUV lithography. The light source is based on a short pulse, high power, high repetition rate CO2 master oscillator power amplifier (MOPA) laser system and a Tin droplet target. A maximum conversion efficiency of 4.5% was measured for a CO2 laser driven Sn plasma having a narrow spectrum at 13.5 nm. In addition, low debris generation was observed. The CO2 MOPA laser system is based on commercial high power cw CO2 lasers. We have achieved an average laser power of 7 kW at 100 kHz by a single laser beam with good beam quality. In a first step, a 50-W light source is under development. Based on a 10-kW CO2 laser, this light source is scalable to more than 100 W EUV in-band power.

Paper Details

Date Published: 13 September 2007
PDF: 8 pages
Proc. SPIE 6703, Ultrafast X-Ray Sources and Detectors, 670309 (13 September 2007); doi: 10.1117/12.732254
Show Author Affiliations
Akira Endo, Extreme Ultraviolet Lithography System Development Association (Japan)
Tamotsu Abe, Extreme Ultraviolet Lithography System Development Association (Japan)
Hideo Hoshino, EUVA (Japan)
Yoshifumi Ueno, Extreme Ultraviolet Lithography System Development Association (Japan)
Masaki Nakano, EUVA (Japan)
Takeshi Asayama, Extreme Ultraviolet Lithography System Development Association (Japan)
Hiroshi Komori, Extreme Ultraviolet Lithography System Development Association (Japan)
Georg Soumagne, Extreme Ultraviolet Lithography System Development Association (Japan)
Hakaru Mizoguchi, Extreme Ultraviolet Lithography System Development Association (Japan)
Akira Sumitani, Extreme Ultraviolet Lithography System Development Association (Japan)
Koichi Toyoda, Extreme Ultraviolet Lithography System Development Association (Japan)


Published in SPIE Proceedings Vol. 6703:
Ultrafast X-Ray Sources and Detectors
Zenghu Chang; George A. Kyrala; Jean-Claude Kieffer, Editor(s)

© SPIE. Terms of Use
Back to Top