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Proceedings Paper

Advances in optoelectronic methodology for micro- and nano-scale measurements
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Paper Abstract

Advances in emerging technologies of microelectromechanical systems (MEMS) and nanotechnology, especially relating to the applications, constitute one of the most challenging tasks in today's micromechanics and nanomechanics. In addition to design, analysis, and fabrication capabilities, this task also requires advanced test methodologies for determination of functional characteristics of devises produced to enable verification of their operation as well as refinement and optimization of specific designs. In particular, development of miniscule devices requires sophisticated design, analysis, fabrication, testing, and characterization tools. These tools can be categorized as analytical, computational, and experimental. Solutions using the tools from any one category alone do not usually provide necessary information on MEMS and extensive merging, or hybridization, of the tools from different categories is used. One of the approaches employed in this development of structures of contemporary interest, is based on a combined use of the analytical, computational, and experimental solutions (ACES) methodology. Development of this methodology was made possible by recent advances in optoelectronic methodology, which was coupled with the state-of-the-art computational methods, to offer a considerable promise for effective development of various designs. This approach facilitates characterization of dynamic and thermomechanical behavior of the individual components, their packages, and other complex material structures. In this paper, recent advances in optoelectronic methodology for micro-and nanoscale measurements are described and their use is illustrated with representative examples.

Paper Details

Date Published: 18 June 2007
PDF: 15 pages
Proc. SPIE 6616, Optical Measurement Systems for Industrial Inspection V, 66162V (18 June 2007); doi: 10.1117/12.732042
Show Author Affiliations
Ryszard J. Pryputniewicz, Worcester Polytechnic Institute (United States)


Published in SPIE Proceedings Vol. 6616:
Optical Measurement Systems for Industrial Inspection V
Wolfgang Osten; Christophe Gorecki; Erik L. Novak, Editor(s)

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