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Proceedings Paper

Calculation of MRF influence functions
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Paper Abstract

Magnetorheological finishing (MRF) is a commonly used computer-controlled polishing (CCP) technique for high precision optical surfaces. The process is based on a magnetorheological abrasive fluid, which stiffens in a magnetic field and may be employed as a sub-aperture polishing tool. Dependent upon the surface error-profile of the workpiece and the polishing tool characteristic (influence function) an individual polishing procedure is calculated prior to processing. However, determination of the influence function remains a time consuming and laborious task. A user friendly and easy to use software tool has been developed, which enables rapid computation of MRF influence functions dependent on the MRF specific parameters, such as, magnetic field strength or fluid viscosity. The software supersedes the current cumbersome and time consuming determination procedure and thus results in considerably improved and more economical manufacture. In comparison with the conventional time period of typically 20 minutes to ascertain an influence function, it may now be calculated in a few seconds. An average quality improvement of 57% relating to the peak-valley (PV) value, and approximately 66% relating to the root-mean-square (RMS) of the surface error-profiles was observed during employment of the artificial computed influence functions for polishing.

Paper Details

Date Published: 14 September 2007
PDF: 12 pages
Proc. SPIE 6671, Optical Manufacturing and Testing VII, 66710Y (14 September 2007); doi: 10.1117/12.730806
Show Author Affiliations
Markus Schinhaerl, Univ. of Applied Sciences Deggendorf (Germany)
Univ. of the West of England (United Kingdom)
Gordon Smith, Univ. of the West of England (United Kingdom)
Andreas Geiss, Univ. of Applied Sciences Deggendorf (Germany)
Lyndon Smith, Univ. of the West of England (United Kingdom)
Rolf Rascher, Univ. of Applied Sciences Deggendorf (Germany)
Peter Sperber, Univ. of Applied Sciences Deggendorf (Germany)
Elmar Pitschke, Univ. of Applied Sciences Deggendorf (Germany)
Univ. of the West of England (United Kingdom)
Richard Stamp, Univ. of the West of England (United Kingdom)


Published in SPIE Proceedings Vol. 6671:
Optical Manufacturing and Testing VII
James H. Burge; Oliver W. Faehnle; Ray Williamson, Editor(s)

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